Semiconductor Industry
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12″ Ceramic Robot Blade
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Material Ceramic
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300 mm RTP WINDOW
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Material Quartz
Process Diffusion
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Alumina oxide Robot Blade
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Material Alumina
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Alumina Robot Blade
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Material Alumina
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Anodize
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Anodize
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Anodize
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Baffle Plate
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Material Si
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Bell Jar
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Material Quartz
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Ceramic Carrier
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Material Ceramic
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Ceramic Coated ESC
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Ceramic coated Treatment
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Ceramic coating Telfon Robot Blade
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Material Ceramic
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Ceramic Robot Blade
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Material Ceramic
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Chamber Wall Liner
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Material Metal
Process Etch
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CLR Lower Shield
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Material Metal
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CLR Upper Shield
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Material Metal
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Collimator
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Material Metal
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Coupling Ring
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Material Quartz
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DEPO Shield Ring
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Material Metal
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Door
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Material Graphite
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Electrode
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Material Si
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Electrode Ground
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Material Graphite
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Front Plate
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Material Graphite
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Gas injector
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Material Quartz
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Ground Ring
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Material Quartz
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Insert
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Material Graphite
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Insert Ring
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Material Si
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Insulator Back
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Material Ceramic
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Insulator Bottom
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Material Ceramic
Product Info
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Substrate holder
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Material Ceramic
Process ICP
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shield frame
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Material Ceramic
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Plate
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Material Ceramic
Process ICP
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Normal Head
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Material Ceramic
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Ceramic coating Telfon Robot Blade
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Material Ceramic
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Alumina Robot Blade
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Material Alumina
